Industry News, Trends and Technology, and Standards Updates

SEMI’s Smart Manufacturing Standards Survey: Usage, Requirements, Expectations, and Issues

Posted by Alan Weber: Vice President, New Product Innovations on Dec 7, 2022 10:30:00 AM

Earlier this quarter (October 2022) the SEMI Smart Manufacturing Council conducted one of its regular meetings with factory stakeholders to determine what sort of SEMI-sponsored activities could accelerate this important industry initiative. One focus area of the discussion was getting more and better data out of the sub-fab, since the performance and integration of these components is becoming more important for many of the leading manufacturers. The related, familiar topic of achieving better visibility into equipment and process behavior was also raised.

In that context, as it often does, the role of industry standards came up as a key enabling technology. The following question was posed: “Are the current standards sufficient to support the broad range of smart manufacturing use cases that factories envision, or does more need to be done? Specifically, since the Information and Control Committee is working on the Freeze 3 version of the EDA (Equipment Data Acquisition, also known as Interface A) suite of standards, are there problems that need to be addressed to improve the adoption of usage of these standards?”

This question triggered a lively (but non-convergent!) conversation among the participants in the meeting, many of whom have years (no, decades) of experience working in the standards community. Before long, it became clear that the group had no clear answer to these questions, and that more information from the actual user community was needed. Someone suggested that the Council pose the questions to a broader audience in survey form, and this proposal was enthusiastically accepted. Several of us volunteered to generate a draft survey for SEMI’s review and refinement, which got the activity off to a running start.

Given this opportunity to connect directly with the ultimate beneficiaries of SEMI Standards, there was a temptation to broaden the survey’s scope to cover other topics of interest in the smart manufacturing domain. Cognizant of the fact that the longer surveys have a lower chance of being returned with useful data, however, the group largely resisted this temptation, including the most important questions in an easy-to-answer format, leaving room for optional additional information in the responses for those so inclined.  

The final survey was issued by SEMI around October 21,2022 with a requested response date of November 15 (which has been extended to gather more feedback). Rather than repeat the entire content here, I include the following excerpts from the introduction and the table of contents:

The purpose of this questionnaire is to assess the status of the industry’s experience with and impressions of the SEMI EDA (Equipment Data Acquisition) standards suite to guide current and future initiatives that improve its capabilities, communicate implementation best practices, and foster broader adoption to realize the vision of SEMI’s Smart Manufacturing Community.

Respondents to this questionnaire should include companies that have already deployed the EDA standards in volume production as well as those that have yet to do so. Respondents in the latter category can simply skip the questions about current usage/issues.

The target audience was originally thought to be stakeholders in 300mm wafer fabs, but with the growing interest in enhanced data collection and automation for backend (packaging, assembly, and test) factories AND growth in the 200mm wafer fab segment (including new models of 200mm manufacturing equipment), it has been broadened to include these domains as well.  

Most questions are posed in multiple choice format, but additional detail is always welcome in the Comments fields where appropriate.

SEMI will compile the responses and share the result with the industry while preserving the anonymity of individual responses.

  1. Manufacturing Stakeholders
  2. Manufacturing KPIs (Operational Performance)
  3. Manufacturing Application Support
  4. Automation Requirements and Equipment Acceptance
  5. Current (or intended) Usage
  6. Issues and Expectations
  7. Other Data Collection Needs

Appendix – Stakeholders and Acronyms

 

Survey-SEMI-Blog-pic1A

Survey-SEMI-blog-pic2

 

Moreover, at this writing, the link to the on-line survey is still active here: 
à SEMI Equipment Data Acquisition / Interface A Standards Survey – Questionnaire on Usage, Requirements, Expectations, and Issues.

Finally, if you are interested in the details of the survey, and especially if you would like to provide your inputs directly to SEMI, you should contact Mark da Silva, Chair, SEMI Smart Manufacturing, Global Executive Committee, at mdasilva@semi.org.

And as always, to discuss your company’s specific Smart Manufacturing journey and to understand how we at Cimetrix by PDF Solutions can help, click on the contact button below. We look forward to hearing from you!

Contact Us

 

 

Topics: Industry Highlights, SECS/GEM, Semiconductor Industry, Doing Business with Cimetrix, Smart Manufacturing/Industry 4.0

Summer 2022 North America Information & Control Committee Report

Posted by Brian Rubow: Director of Solutions Engineering on Jul 26, 2022 10:00:00 AM

Background

The North America Information & Control Committee (I&CC or NA I&CC) is comprised of several task forces including GEM 300, Diagnostic Data Acquisition (DDA), Advanced Backend Factory Integration (ABFI), Fab & Equipment Computer and Device Security (CDS), and Graphical User Interfaces (GUI). These task forces and the committee all met during the week of SEMICON West, July 11-13, 202. Not long ago, SEMI regulations were modified to allow TC Chapter (Committee) voting in virtual meetings; therefore, the standards activities continue to move forward. In-person task force participation was much higher than the last meetings, but remote participation also remains strong. This blog is a summary of the activities in each task force.

GEM 300 Task Force

Here is a summary of worldwide activities related to the GEM 300 task force as of the start of the GEM 300 task force meeting.

Region

Ballot

Standard(s)

Status

Topic

Korea

5832

New

?

Generic Counter

NA

6572

E30

Adjudication

Add Stream 21, more stream 2, Cleanup Process Program Management.

NA

6835

E87

Development

Carrier Ready to Unload Prediction update

NA

6836

E87/E90

Development

Extending substrate characteristics, such as for Bonder/Debonder support and other applications

NA

6859

E116

Adjudication

Recommendations from the ABFI task force

NA

6893

E5

Published

Errata

China

6914

E87

Development

Modify E87 to allow for more equipment adoption, particularly in the semiconductor backend.

NA

6916

E5

Adjudication

FormatCode for OperatorCommand. Various Errata.

 

 

Three ballots were adjudicated during the GEM 300 task force meeting. The term “adjudication” means we review the voting and recommend handling of all negative votes and comments received to ultimately accept the ballot for publication or reject the ballot for rework. The recommendations by the task force are then finalized at the committee meeting. Usually, the task force recommendation is accepted by the committee, as was the case in all three ballots.

6916 E5

This ballot proposes to modify the E5 SECS-II standard and included the following minor changes:

  • Allow data variable OperatorCommand to be type ASCII.
  • Correct various typographical errors
  • Remove the dependency between variables MDLN (equipment model number) and EqpSerialNum (equipment serial number).

This ballot passed after the only negative was withdrawn by the voter.

6572B E30

This ballot proposes to modify the GEM (E30) standard. It is a revision ballot, meaning the entire E30 standard is subject to review. This is the third time the ballot has been submitted. It is a major update to the GEM standard and includes the following changes:

  • Process Program Management changes
    • The terms “recipe” and “process program” are currently used nearly interchangeably. The proposal is to use the term “process program” exclusively.
    • References to E42, large formatted and large process programs are moved out of the main standard and into the appendix.
    • Stream 21 messages are introduced for process program management, including both the single and multiple message techniques. This provides a simplified way for GEM interfaces to upload and download large process programs.
    • The entire process program management section is vastly reorganized to help implementers understand the available alternatives and the scenarios for each available alternative. New tables were introduced to compare and summarize implementation alternatives.
    • Collection event ‘Process Program Error’ is specifically listed as required, rather than just as an implied requirement.
  • A series of new SECS-II messages are introduced including S2F51-S2F64. These are new capabilities to make a GEM interface more transparent.
  • S5F7/F8 is added to the alarm management capability for similar reasons.
  • Two new GEM documentation features are added and made available through the GEM interface using Stream 21 messages including PDF documentation and SEDD (see SEMI E172) documentation. This should make it easier to distribute GEM documentation and ensure that the right documentation is referenced.
  • Two new equipment identification features are added, one to identify the equipment supplier and one to uniquely identify each individual equipment. This should make it easier to identify and track specific equipment on the factory floor.
  • Some changes related to terminology are included. SEMI regulations recently were updated with a list of restricted bias terminology which are not allowed in any SEMI standards and a list of terms to avoid when possible.

This ballot failed due to a disagreement regarding a proposed change to the GEM control state model collection on transition 10 related to the host off-line state. The task force remains evenly divided on this issue; therefore, this change will be withdrawn from the next revision of this ballot.

I am optimistic that the 6572C revision of this ballot will pass voting with little controversy. This ballot has already been distributed to the task force for final review. Little controversy remains unless some voter raises a new issue.

6859 E116

Originally ballot 6859 intended to add significant new features to the E116 standard. However, the aggressive changes have been abandoned. Instead, this ballot is focused on making one change to E116. Currently the E116 specification implements collection events in a manner inconsistent with E30, E40, E87, E90, E94, E109, and E157. This E116 ballot failed. After further discussion in the task force, consensus on the proposed changes seems possible in the next voting cycle. The updated ballot 6859A has already been submitted for review by the task force.

DDA Task Force

The DDA task force has been and continues to update the Equipment Data Acquisition (EDA a.k.a. Interface A) standards with the goal to approve an EDA Freeze 3 set of standards based on gRPC technology. To date the following ballots have been completed:

Standard (Ballot)

Ballot Status

E138 (6336)

Published - 03/15/2019

E120 (6434)

Published – 05/30/2019

E145 (6436)

Published – 05/31/2019

E178 (6300)

Published – 01/10/2020

E179 (6803)

Published – 03/11/2022

E132 (6719A)

Published – 04/29/2022

E132.2 (6346F)

Published – 04/29/2022

E125 (6718A)

Published – 04/22/2022

E134 (6720A)

Approved - In Publication Queue

E134.2 (6347A)

Approved - In Publication Queue

E179 (6837)

Approved - In Publication Queue

E125.2 (6345A)

Approved - In Publication Queue

E125 (6891)

Approved - In Publication Queue

E179 (6892)

Approved - In Publication Queue

E120.2 (6908)

Approved - In Publication Queue

During these meetings, three DDA task force ballots failed adjudication, 6927 (E125, E125.2), 6928 (E132, E132.2) and 6929 (E134, E134.2) due to procedural errors which violated SEMI regulations. This is primarily due to a long backlog of publications on previously approved specifications. Discussions were held in several meetings in an attempt to find ways to help SEMI get caught up on publications. The delay in publication is partly due to the several large ballots that were backlogged when COVID activity prevented the committee from completing adjudication in remote or hybrid meetings.

Test Session #1

The most important activity for the DDA task force was “vender test session #1” held on Thursday, July 14. An open invitation was made to all task force members to participate in an E132 test session. Anyone could submit a client and/or equipment server implemented with the current E132 and E179 specifications. Four companies came together and ran tests against each other’s software. Each participant will provide the task force with a list of issues in E132 and E179. This was a great opportunity to try the gRPC technology together and get a sense of what issues still need to be resolved before EDA Freeze 3 is complete.

DDA Freeze 3 Plans

The DDA Task force plans an update to E125, E132, and E134 including changes from the recently failed ballots as well as topics raised in the test session. Due to the expanded scope, new ballot numbers will be issued. Additionally plans to update E164 are also moving forward. The biggest challenge for E164 will be converting the XML files into JSON files. Either JSON5 or JSONC will likely be used since comments are mandatory in the E164 complementary files which show how to create GEM 300 capable EDA equipment models.

ABFI Task Force

The Advanced Backend Factory Integration task force is actively working on two ballots.
One ballot is a minor update to the E142, the substrate mapping specification which facilitates traceability and other application where substrate, tray, feeder, and other information can be shared between a factory and equipment. The minor update will add additional substrate types so E142 substrate maps can be used in more applications.

Additionally, the task force is working on ballots 6924 and 6925. The 6924 specifications will define the management of Consumable and Durables on manufacturing equipment. Features include allowing the host to accept or reject newly mounted consumables and durables. Additionally, the equipment will be able to report on consumable and durable usage. While technically both can already be done, the specification establishes a standard way for the features to be implemented. The 6925 ballot maps 6924 for usage in a GEM interface. The plan is to submit the ballot for the next voting cycle.

GUI Task Force

The GUI task force continues to work on a major revision of the E95 specification for Human Interfaces for Semiconductor Equipment. In addition to updating the specification with changes in software development, this revision will establish requirements for the usage of human interfaces on equipment using devices with small screens. The task force seems to be gaining consensus of many topics and getting ready to submit the ballot for voting.

Getting Involved

For those interested in participating, it is easy to join SEMI standards activities. Anyone can register at www.semi.org/standardsmembership.

All SEMI task force ballot activities are logged here.

After joining the standards activities, anyone can get involved. The task forces post everything on the connected @ SEMI website https://connect.semi.org/home. Here are the community names for the task forces covered in this blog:

  • GEM 300 Task Force - North America
  • Diagnostic Data Acquisition Task Force - North America
  • Fab & Equipment Computer and Device Security (CDS) Task Force – North America
  • Advanced Backend Factory Integration (ABFI) Task Force – North America
  • Graphical User Interfaces (GUI) Task Force - North America

Topics: Industry Highlights, SECS/GEM, Semiconductor Industry, EDA/Interface A, Doing Business with Cimetrix, Smart Manufacturing/Industry 4.0, Standards

A New Benefit for our CIMConnect Customers: Training Videos Available Now

Posted by Brian Rubow: Director of Solutions Engineering on Nov 24, 2021 11:45:00 AM

Background

Cimetrix CIMConnectTM customers enjoy many benefits to maintaining an active support contract, and today we are announcing yet another one: access to a set of product-specific training videos.

A few years ago, the Solutions Engineering team at the Cimetrix Connectivity Group posted product training material including the full set of CIMConnect training PowerPoint presentations to facilitate self-training for those unable to attend a formal session. We update this repository periodically as the training material is revised and improved. The material is available online through the Customer Portal. After logging in, you can find the presentations here:

CIMConnect-training-videos-pic1

Training Videos

To complement the presentation material shown above, the Solutions Engineering team is now creating video training material. As of mid-June, 2021, the first set of training videos for CIMConnect is also available via the customer portal (see below).

CIMConnect-training-videos-pic2

By clicking on the “CIMConnect Video Library”, you can see full set of available training videos and access them via this table:

CIMConnect-training-videos-pic3

The material is organized by topic, such as Collection Events or Status Variables. Each topic is subdivided into one or more instruction parts. When there is a lab, the implementation of the lab is covered twice. First, the implementation of the lab is reviewed and demonstrated in CIMConnect’s “Getting Started” sample application. Second, the lab is implemented step by step from scratch in a new application.

A few of the training PowerPoint presentations are not yet complete but should be available soon. This includes topics like Remote Commands, Equipment Constants, Factory Setup, and Operator Interface. Solutions Engineering plans to expand the training to other products as well.

Also, note that other videos are also available that go beyond the scope of the training material. These are found on the same “CIMConnect Video Library” page at the bottom.

Customers are welcome to purchase CIMConnect training and/or consulting services at any time. The training material described above is not a substitute for working directly with a product and standards expert, where a customer can discuss specific equipment hardware, software architecture, and unique customer requirements. Nevertheless, this material should help our customers when they need a refresher course and especially when new employees are assigned to work with CIMConnect after its initial development.

Topics: Industry Highlights, SECS/GEM, Semiconductor Industry, Smart Manufacturing/Industry 4.0, Cimetrix Products

Standards Activity Report SEMI NA Spring 2021

Posted by Brian Rubow: Director of Solutions Engineering on May 12, 2021 11:45:00 AM

Stcked_Standards_logoFor the first time since the Fall of 2019, the SEMI North America Information & Control Committee (I&CC) was finally able to meet and conduct business online. Throughout all of 2020, the I&CC was not able to meet because SEMI regulations did not at that time allow voting in online meetings. Instead, only the task forces have been meeting. As a result, any passing ballots, unless super clean, had to wait for adjudication in the North America I&CC.

This year, prior to the I&CC meeting on April 1 and 2, all of the associated task forces also met as usual, including the GEM 300, Diagnostic Data Acquisition (DDA), and Advanced Backend Factory Integration (ABFI) task forces. Moreover, the I&CC was able to conduct all the unresolved business that had accumulated over the last year. During the committee meeting, the I&CC successfully used the SEMI Virtual Meeting (SVM) software which runs in an internet browser, allows each committee member to log in, and allows for official voting to take place during the meeting. The North America I&CC will meet again during the summer.

GEM 300 Task Force

In the GEM 300 task force, the primary activity was to officially redefine its charter and scope to match what it has already been doing for the last 20 years. Each SEMI task force defines a “Task Force Organization Force” document (aka TFOF) to establish its charter and scope. Somehow, the GEM 300 task force charter and scope were severely out of date.

In addition to this update, some changes to the E5 standard finally passed voting, pending some final approval. The E5 changes include several new messages and establish definitions for commonly used data collection terminology. The new messages complement the existing set of messages by allowing the host to query information about the current data collection setup. Currently, it is common for a host program to reset and redefine all data collection after first connecting to an equipment because there has been no way to query this information. With these new messages, the host will be able to query the setup and confirm that no data collection has changed while disconnected. Finally, it will be easier to test GEM interfaces with these new messages.

The task force already approved tasks to consider some major work to the GEM standard. The task force is also considering changes to the E116 standard, but there is some resistance to these changes. Here is a summary table of the GEM-related standards activity from across the globe.

Region

Ballot

Standard(s)

Status

Topic

South Korea

5832

New

Cycle 5, 2020

Generic Counter

South Korea

6695

E87

Adjudication

Ready to unload prediction changes.

North America

6572

E30

Development

Add Stream 21, more stream 2, Cleanup Process Program Management.

North America

6552

E5

Adjudicated Spring 2021

Data collection setup, terminology. Ratification ballot proposed.

2 line-items pending since Summer 2020

North America

6598

E37, E37.1

Cycle 7, 2020

Standardize TCP/IP port numbers

North America

6597

E173

Adjudicated Spring 2021

Minor updates, clarification

Pending since Spring 2020.

North America

6647

E116

SNARF Revision

Recommendations from the ABFI task force

North America

6683

E148

Development

Line item revision

 

DDA Task Force

In the Diagnostic Data Acquisition (DDA) task force (responsible for the EDA standards, aka Interface A), freeze 3 development is moving forward. All of the ballots still failed as expected. The number of remaining technical issues nevertheless has dwindled to just a handful. E132, E125, and especially E164 need the most work.

Following is a summary of the previously completed work.

Standard (Ballot)

Ballot Status

Lead

E132 (6337)

Published - 04/29/2019

Brian Rubow (Cimetrix)

E138 (6336)

Published - 03/15/2019

Brian Rubow (Cimetrix)

E134 (6335)

Published – 03/29/2019

Inhyeok Paek (Link Genesis)

E120 (6434)

Published – 05/30/2019

Inna Skvortsova (SEMI)

E145 (6436)

Published – 05/31/2019

Inna Skvortsova (SEMI)

E178 (6300)

Published – 01/10/2020

Mitch Sakamoto (ZAMA)

E179 (6344A)

Published – 03/27/2020

Albert Fuchigami (PEER)


And here is a summary of the work in progress.

Standard (Ballot)

Ballot Status

Lead

E125 (6718)

Development

Brian Rubow (Cimetrix)

Hyungsu Kim (Doople)

E132 (6719)

Development

Mitch Sakamoto (ZAMA)
Albert Fuchigami (PEER)

E134 (6720)

Development

Brian Rubow (Cimetrix)

E164

 

Alan Weber (Cimetrix)

E125.2 (6345)

Development

Albert Fuchigami (PEER)

E132.2 (6346E)

Development

Albert Fuchigami (PEER)

E134.2 (6347)

Development

Albert Fuchigami (PEER)

E125 (6527C)

To Abolish

Replaced by 6718

E132 (6571C)

To Abolish

Replaced by 6719

E134 (6553C)

To Abolish

Replaced by 6720

 

All of the failed ballots will be reworked and resubmitted for voting. For many of these ballots, it will be the sixth time to go through the SEMI ballot procedure. Consensus is very nearly achieved, and the defects in the ballots have been identified and corrected. Additionally, there are plans to modify SEMI E179, the standard that defines how gRPC will be utilized. While testing EDA freeze 3, Cimetrix has identified two simple ways to modify the E179 protocol buffer files in order to reduce overhead. These and a few other changes will be proposed in a new ballot.

One of the last changes to the freeze 3 standards will be the introduction of passwords. In the current freeze 1 and freeze 2 versions, there are no passwords. Any client that knows a valid, unused Access Control List entry (ACL, the equivalent of a user name) can connect; therefore, there really isn’t any authentication unless using the SSL protocol with certificates. Passwords will enhance EDA security and facilitate EDA interface setup by allowing client applications to use the same ACL entry while defining a unique password to block other clients from using the same entry. The final E132 ballot will finalize the password feature.

The task force leaders are asking the voting members to raise any final issues before these ballots are submitted to SEMI to the next voting cycle so that we can approve these standards, give implementers a chance to experiment with EDA freeze 3, raise any serious issues that impede the implementation, and then propose the final changes which incorporate that feedback. Until a version of these standards is formally approved, it will be difficult to get concrete and widespread feedback on the new technology, which is a necessary precursor to its adoption and use.

ABFI Task Force

The Advanced Factory Integration task force passed more changes in E142 without controversy. The task force plans to create E142.4, another GEM implementation of E142, designed for larger wafer maps to allow for increased traceability possibilities. Additionally, the task force continues to make plans to develop an adoption matrix as a new standard to describe when GEM and GEM 300 standards should be adopted in backend equipment based on equipment features.

Topics: Industry Highlights, SECS/GEM, Semiconductor Industry, EDA/Interface A, Doing Business with Cimetrix, Smart Manufacturing/Industry 4.0, GEM300, Standards

Summer 2020 North America GEM 300 Task Force Report

Posted by Brian Rubow: Director of Solutions Engineering on Jul 22, 2020 10:45:00 AM

Background

The SEMI North America GEM 300 task force is part of the North America Information and Control Committee (I&CC or NA I&CC). Normally this task force meets in San Francisco as part of SEMICON West. However, this year the technical committee meetings are spread over several weeks and don’t coincide directly with SEMICON West. Additionally, the I&CC did not meet at all because SEMI regulations do not currently allow TC Chapter (Committee) voting in virtual meetings. That will hopefully change later this year, but for now inhibits the pace of SEMI standards development.

However, the GEM 300 task force did meet on Monday July 13, 2020, and continues to develop SEMI standards. I am co-leader of the NA GEM 300 task force, along with Chris Maloney from Intel. This blog is a summary of the current task force activities.

Pre-Meeting Summary

The table below contains a summary of the worldwide activities related to the GEM 300 task force as of the start of this summer’s meeting. There are corresponding task forces in the Japan and South Korea regions which are also active.

Region

Ballot

Standard(s)

Status

Topic

South Korea

5832

New

Cycle 5, 2020

Generic Counter

North America

6348

E30

Published

SEMI style/regulation conformance

North America

6572

E30

Development

Add Stream 21, Cleanup Process Program Management.

North America

6552

E5

Cycle 5, 2020

Data collection setup, terminology

North America

6598

E37, E37.1

Cycle 5, 2020

Standardize TCP/IP port numbers

North America

6597

E173

Adjudication Pending

Minor updates, clarification

Awaiting I&CC adjudication from cycle 2, 2020 voting (no negatives) and the task force recommendation from Spring 2020.

North America

6647

E116

Development

Recommendations from the ABFI task force

 

Current Ballot Activity

Two ballots were adjudicated during the most recent GEM 300 task force meeting. For those of you new to the standards development process, the term “adjudication” means that we review the results of the voting and recommend handling of all negative votes and comments received. The recommendations by the task force are then presented to and finalized at the committee level. Since the North America I&CC did not meet, the failed and super-clean ballots are being transferred to other regions (probably Taiwan) for further processing. Passed ballots with any negatives or comments are put on hold until NA I&CC meets so that the merits of the comments and overridden negatives can be evaluated.

6552A E5

This ballot modifies the E5 SECS-II standard. The ballot included three line-items, each of which is voted on separately

  1. This is the most exciting activity in this ballot because it will give GEM host software much better tools for managing and testing GEM data collection. The first line item proposed adding several new messages to the E5 standard including a message to:
    1. Query the list of defined report identifiers
    2. Query report definitions
    3. Query a list of event report links
    4. Query the list of enabled events (this could already be done using Status Variable EventsEnabled)
    5. Query the list of streams and functions configured for spooling
    6. Query the list of defined trace identifiers
    7. Query trace definitions
  1.  
  2. Establish proper definitions for status variables, data variables and equipment constants. Additionally, deprecate the usage of the data item “DVNAME” which has generated confusion for years since it means a data variable identifier and not a data variable name.
  3. Clarify the usage of message S7F17/F18. This message allows deletion of one or more recipes, but only returns a single acknowledgement code. The new clarification defines what to expect when an error is returned.

Each of the line items had at least one comment or negative; therefore, none was super-clean. The GEM 300 task force decided to pass line items 1 and 3, but fail line item 2.

6598A E37

The primary purpose of this ballot is to clarify some confusing text related to the T8 timer. Additionally, there are other improvements related to recommended settings. The GEM 300 task force decided to fail this ballot.

New Ballot Activity

Here is a summary of the next set of ballots to expect from the NA GEM 300 task force planned to be presented for Cycle 7 voting later this year.

Ballot

Specification

Description

6552B

E5

A rework of ballot 6552A line item #2, which is described above.

6598B

E37

A rework of ballot 6598A described above.

6647

E116

Recommendations from the ABFI task force to allow the GEM host to declare scheduled/unscheduled down time and for the equipment to declare an Engineering mode. This will allow E116 to map better to E10.

6572

E30

A major change to the GEM standard to officially allow usage of Stream 21 for large unformatted recipes and E172 SEDD files, deprecation of some little used recipe alternatives like E42, implementation of the new E5 messages from ballot 6552A line item #1, and several other enhancements.

Note that the ballot number will be changing due to a late scope change.

?

E148

Upgrade NTP from version 3 to version 4.

 

Getting Involved

For those interested in participating, it is easy to join SEMI standards activities. Anyone can register at www.semi.org/standardsmembership.

All SEMI task force ballot activities are logged at http://downloads.semi.org/web/wstdsbal.nsf/TFOFandSNARFsbyCommittee?OpenView&Start=1&Count=1000&ExpandView

After joining the standards activities, anyone can get involved. The task forces post everything on the connected @ SEMI website https://connect.semi.org/home. The North America GEM 300 task force community is called “GEM 300 Task Force - North America”.

To find out more about SEMI Standards, GEM300, or to talk to standards expert, click the button below. 

Ask an Expert

Topics: Industry Highlights, SECS/GEM, Semiconductor Industry, GEM300

The Convergence of Technologies and Standards in Smart Manufacturing Blog

Posted by Ranjan Chatterjee on Apr 22, 2020 11:45:00 AM

Feature by Ranjan Chatterjee, CIMETRIX
and Daniel Gamota, JABIL

Abstract

The vertical segments of the electronic products manufacturing industry (semiconductor, outsourced system assembly, and test, and PCB assembly) are converging, and service offerings are consolidating due to advanced technology adoption and market dynamics. The convergence will cause shifts in the flow of materials across the supply chain, as well as the introduction of equipment and processes across the segments. The ability to develop smart manufacturing and Industry 4.0 enabling technologies (e.g., big data analytics, artificial intelligence (AI), cloud/edge computing, robotics, automation, IoT) that can be deployed within and between the vertical segments is critical. The International Electronics Manufacturing Initiative (iNEMI) formed a Smart Manufacturing Technology Working Group (TWG) that included thought leaders from across the electronic products manufacturing industry. The TWG published a roadmap that included the situation analysis, critical gaps, and key needs to realize smart manufacturing.Article First Posted by SMT007 Magazine

Introduction

The future of manufacturing in the electronics industry is dependent on the ability to develop and deploy suites of technology platforms to realize smart manufacturing and Industry 4.0. Smart manufacturing technologies will improve efficiency, safety, and productivity by incorporating more data collection and analysis systems to create a virtual business model covering all aspects from supply chain to manufacturing to customer experience. The increased use of big data analytics and AI enables the collection of large volumes of data and the subsequent analysis more efficient. By integrating a portfolio of technologies, it has become possible to transition the complete product life cycle from supplier to customer into a virtual business model or cyber-physical model. Several industry reports project manufacturers will realize tens of billions of dollars in gains by 2022 after deploying smart manufacturing solutions. In an effort to facilitate the development and commercialization of the critical smart manufacturing building blocks (e.g., automation, machine learning, or ML, data communications, digital thread), several countries established innovation institutes and large R&D programs. These collaborative activities seek to develop technologies that will improve traceability and visualization, to enable realtime analytics for predictive process and machine control, and to build flexible, modular manufacturing equipment platforms for highmix, low-volume product assembly.

The vertical segments of the electronic products manufacturing industry (semiconductor (SEMI), outsourced system assembly, and test (OSAT), and printed circuit board assembly (PCBA) are converging, and service offerings are being consolidated. This occurrence is due to the acceleration of technology development and the market dynamics, providing industry members in specific vertical segments an opportunity to capture a greater percentage of the electronics industry’s total profit pool.

The convergence of the SEMI, OSAT, and PCBA segments will cause shifts in the flow of materials across the supply chain, as well as the introduction of equipment and processes across the segments (e.g., back-end OSAT services offered by PCBA segment). OSAT services providers are using equipment and platforms typically found in semiconductor back-end manufacturing, and PCBA services providers are installing equipment and developing processes similar to those used by OSAT.

The ability to develop smart manufacturing technologies (e.g., big data analytics, AI, cloud/ edge computing, robotics, automation, IoT) that can be deployed within the vertical segments as well as between the vertical segments is critical. In addition, the ability to enable the technologies to evolve unhindered is imperative to establish a robust integrated digital thread.

As the electronic products manufacturing supply chain continues to evolve and experience consolidation, shifts in the traditional flow of materials (e.g., sand to systems) will drive the need to adopt technologies that seamlessly interconnect all facets of manufacturing operations. The iNEMI Smart Manufacturing TWG published a roadmap that would provide insight into the situation analysis and key needs for the vertical segments and horizontal topics (Figure 1) [1].

Horizontal-topics-across-vertical-segments

In this roadmap, the enabling smart manufacturing technologies are referred to as horizontal topics that span across the electronics industry manufacturing segments: security, data flow architecture, and digital building blocks (AI, ML, and digital twin).

The three electronics manufacturing industry segments SEMI, OSAT, and PCBA share some common challenges:•

  • Responding to rapidly changing, complex business requirements
  • Managing increasing factory complexity
  • Achieving financial growth targets while margins are declining
  • Meeting factory and equipment reliability, capability, productivity, and cost requirements
  • Leveraging factory integration technologies across industry segment boundaries
  • Meeting the flexibility, extendibility, and scalability needs of a leading-edge factory
  • Increasing global restrictions on environmental issues

These challenges are increasing the demand to deploy, enabling smart manufacturing solutions that can be leveraged across the verticals.

Enabling Smart Manufacturing Technologies (Horizontal Topics): Situation Analysis

Many of the challenges may be addressed by several enabling smart manufacturing technologies (horizontal topics) that span across the electronics industry manufacturing segments: security, data flow, and digital building blocks. The key needs for these are discussed as related to the different vertical segments (SEMI, OSAT, and PCBA) and the intersection between the vertical segments.

Members of the smart manufacturing TWG presented the attribute needs for the following: security, data flow, digital building blocks, and digital twin. Common across the vertical segments is the ability to develop and deploy the appropriate solutions that allow the ability to manufacture products at low cost and high volume. Smart manufacturing is considered a journey that will require hyper-focus to ensure the appropriate technology foundation is established. The enabling horizontal topics are the ones that are considered the most important to build a strong, agile, and scalable foundation.

Security Security is discussed in terms of two classes: physical and digital. The tools and protocols deployed for security is an increasingly important topic that spans across many industries and is not specific only to the electronics manufacturing industry. Security is meant to protect a number of important assets and system attributes that may vary according to the process (novel and strong competitive advantage) and perceived intrinsic value of the intellectual property (IP).

In some instances, it directly addresses the safety of workers, equipment, and the manufacturing process. In other cases, it transitions toward the protection of electronic asset forms, such as design documents, bill of materials, process, business data, and others. A few key considerations for security are access control [2], data control [3], input validation, process confidentiality, and system integrity [2].

At the moment in manufacturing, in general, IT security issues are often only raised reactively once the development process is over and specific security-related problems have already occurred. However, such belated implementation of security solutions is both costly and also often fails to deliver a reliable solution to the relevant problem. Consequently, it is deemed necessary to take a comprehensive approach as a process, including implementation of security threat identification and risk analysis and mitigation cycles on security challenges.

Data Flow

General factory operations and manufacturing technologies (i.e., process, test, and inspection) and the supporting hardware and software are evolving quickly; the ability to transmit and store increasing volume of data for analytics (AI, ML, predictive) is accelerating. Also, the advent and subsequent growth of big data are occurring faster than originally anticipated. This trend will continue highlighting existing challenges and introducing new gaps that were not considered previously (Figure 2).

As an example, data retention practices must quickly evolve; it has been determined that limitations on data transmission volume and length of data storage archives will disappear (e.g., historical data retention of “all” will become standard practice). Examples of data flow key considerations are data pipes, machine-tomachine (M2M) communication, and synchronous/ asynchronous data transmission.

A flexible, secure, and redundant architecture for data flow and the option considerations (e.g., cloud, fog, versus edge) must be articulated. The benefits and risks must be identified and discussed. Data flow and its ability to accelerate the evolution of big data technologies will enable the deployment of solutions to realize benefits from increases in data generation, storage, and usage. These capabilities delivering higher data volumes at real-time and nearreal- time rates will increase the availability of equipment parameter data to positively impact yield and quality. There are several challenges and potential solutions associated with the increases in data generation, storage, and usage; capabilities for higher data rates; and additional equipment parameter data availability.

The primary topics to address are data quality and incorporating subject-matter expertise in analytics to realizing effective on-line manufacturing solutions. The emergence of big data in electronics manufacturing operations should be discussed in terms of the “5 Vs Framework”:

  1. Volume
  2. Velocity
  3. Variety (or data merging)
  4. Veracity (or data quality)
  5. Value (or application of analytics)

The “5 Vs” are foundational to appreciate the widespread adoption of big data analytics in the electronics industry. It is critical to address the identified gaps—such as accuracy, completeness, context richness, availability, and archival length—to improve data quality to support the electronics manufacturing industry advanced analytics [4].

connectivity-architecture-smart-manufacturing-functionality

Digital Building Blocks

The advancements in the development of digital building blocks (interconnected digital technologies) are providing digitization, integration, and automation opportunities to realize smart manufacturing benefits. These technologies will enable electronics manufacturing companies to stay relevant as the era of the digitally- connected smart infrastructure is developed and deployed. Several technologies considered fundamental digital building blocks are receiving increased attention in the electronics manufacturing industry (e.g., AI, ML, augmented reality, virtual reality, and digital twin).

AI and ML

AI and ML tools and algorithms can provide improvements in production yields and quality. These tools and algorithms will enable the transformation of traditional processes and manufacturing platforms (processes, equipment, and tools). The situation analysis for AI and ML, as well as their enablers, typically consider the following features and operational specifications: communications at fixed frequency, commonality analysis, material and shipment history and traceability, models for predicting yield and performance, predefined image processing algorithms, secure gateway, warehouse management systems.

AI and ML present several opportunities to aggregate data for the purpose of generating actionable insights into standard processes. These include, but are not limited to, the following:

  1. Preventive maintenance: Collecting historical data on machine performance to develop a baseline set of characteristics on optimal machine performance, and to identify anomalies as they occur.
  2. Production forecasting: Leveraging trends over time on production output versus customer demand, to more accurately plan production cycles.
  3. Quality control: Inspection applications can leverage many variants of ML to fine-tune ideal inspection criteria. Leveraging deep learning, convolutional neural networks, and other methods can generate reliable inspection results, with little to no human intervention.
  4. Communication: It is important for members of the electronics manufacturing industry to adopt open communication protocols and standards [5–8].

Digital Twin Technology

The concept of real-time simulation is often referred to as the digital twin. Its full implementation is expected to become a requirement to remain cost-competitive in legacy and new facility types. Digital twin will initially be used to enable prediction capabilities for tools and process platforms that historically cause the largest and most impactful bottlenecks. The ultimate value of the digital twin will depend on its ability to continue to evolve by ingesting data and the availability of data with the “5 Vs”: veracity, variety, volume, velocity, and value. The situation analysis of the digital twin within and between electronics industry manufacturing segments highlight the following data considerations: historical, periodic, and reactive.

The concept of a digital twin lends itself to on-demand access, monitoring and end-toend visualization of production, and the product lifecycle. By simulating production floors, a factory will be able to assess attainable projected KPIs (and what changes are required to attain them), forecast production outputs, and throughputs through a mix of cyber-physical realities (the physical world to the virtual world, and back to the physical world), and expedite the deployment of personnel and equipment to manufacturing floors worldwide.

Enabling Smart Manufacturing Technologies (Horizontal Topics): Key Attribute Needs

Security

Security will continue to be a primary concern as the electronics manufacturing industry adopts technologies and tools that rely on ingested data to improve manufacturing quality and yield and offer differentiated products at a lower cost and higher performance. SEMI members generated a survey to appreciate the needs, challenges, and potential solutions for security in the industry and its supply chain and gather more comprehensive input from the industry in terms of users, equipment and system suppliers, security experts, and security solution providers [9]. It is a topic that permeates many facets of manufacturing: equipment, tools, designs, process guidelines, materials, etc. Processes continue to demand a significant level of security to minimize valuable know-how IP loss; this requirement will generate the greatest amount of discussion such as data partitioning, production recipes, equipment, and tool layout. A few key attribute needs for security are network segmentation [10], physical access, and vulnerability mitigation.

These security issues are not unique to microelectronics manufacturing, and many of the issues go beyond manufacturing in general. The topic of security should reference the challenges and potential solutions across the manufacturing space. As an example, the IEC established an Advisory Committee on Information Security and Data Privacy [11figuredfdafdfd. It is suggested to collaborate with other standards and industry organizations that are developing general manufacturing security roadmaps by delineating specific microelectronics manufacturing issues and focusing on common needs.

Data Flow

The development of a scalable architecture that provides flexibility to expand; connect across the edge, the fog, and the cloud; and integrate a variety of devices and systems generating data flow streams is critical. A smart factory architecture may, for example, accommodate the different verticals in the electronics manufacturing industry as well as companies in non-electronics manufacturing industries.

As mentioned previously, different industries seeking to deploy smart manufacturing technologies should leverage architectures thatprovide the desired attributes; data flow architecture is considered a prime candidate for leveraging and cross-industry collaboration to identify optimum solutions (i.e., data synchronizers, execution clients).

The development and deployment of technologies for data flow are accelerating. Focus on data analytics, and data retention protocols are increasing at a faster rate than first anticipated. It is imperative to collect the critical data as well as to establish guidelines to perform intelligent analysis and to exercise the appropriate algorithms to specify data-driven decisions. Several topics related to data are under consideration, such as general protocols:

  • “All” versus “anomaly” data retention practices
  • Optimization of data storage volumes
  • Data format guidelines for analytics to drive reactive and predictive technologies
  • Data quality protocols enabling improvements in time synchronization, compression/uncompression, and blending/merging
  • Guidelines to optimize data collecting, transferring, storing, and analyzing

Data considerations for equipment are:

  • Defining context data sets for equipment visibility
  • Improving data accessibility to support functions
  • Data-enabled transition from reactive to redictive functionality
  • Data visibility of equipment information (state, health, etc.)

Digital Building Blocks

The ability to deploy the necessary digital building blocks to realize smart manufacturing is at different stages of maturity.

AI and ML

A few key attribute needs for AI and ML are data communication standards, data formatting standards, and 3PL tracking solutions. Technologies, such as AI and ML, are seen as enablers to transition to a predictive mode of operation: predictive maintenance, equipment health monitoring, fault prediction, predictive scheduling, and yield prediction and feedback. This paradigm in AI-enhanced control systems architectures will enable the systems to “learn” from their environment by ingesting and analyzing large data sets. Advanced learning techniques will be developed that improve adaptive model- based control systems and predictive control systems. The continued development and assessment of AI and ML technologies is critical to establish the most robust and well-tuned prediction engines that are required to support emerging production equipment.

Digital Twin Technology

Advances in digital twin technologies are accelerating as the potential benefits are communicated to end-users. Also, the costs for enabling technologies (hardware and software platforms) are becoming less expensive. The following are considered key attribute needs that will increase adoption and broad-based deployment of the digital twin (product design, product manufacturing, and product performance: digital thread, predictive, prescriptive, and systemwide continuous data access.

Digital twin is a long-term vision that will depend on the implementation of discrete prediction capabilities (devices, tools, and algorithms) that are subsequently integrated on a common prediction platform. It is generally considered that the digital twin will provide a real-time simulation of facility operations as an extension of the facility operations system.

The successful deployment of digital twin in a facility environment will require high-quality data (e.g., accuracy, velocity, dynamic updating) to ensure the digital twin is an accurate representation of the real-time state of the fab. Also, the realization of this vision will depend on the ability to design an architecture that provides the key technologies to operate collaboratively by sharing data and capabilities. Ultimately, the success of the digital twin will depend on the ability to develop a path for implementation that provides redundancy and several risk assessment gates.

Prioritized Research, Development, and Implementation Needs

The topic of collaboration is often mentioned in industry-led initiatives as a key element to realize the benefits attributed to smart manufacturing. There is a strong drive by members of the electronics manufacturing industry to engage in activities that foster collaboration. Participants in these activities recognize that solutions must be consensus-based and adopted by many vendors. Equipment suppliers appreciate that deep domain knowledge combined with data analysis contributes to only a fraction of the potential value that can be captured. The optimal value will be realized when data is shared across manufacturing lines in facilities, with vertical segment industry supply chain members and across vertical segments.

Example prioritized research, development, and implementation needs topics are as follows:

  • Define data flow standard interfaces and data formats for all equipment and tools
  • Investigate if data flow continuity between vertical segments should be mandatory or optional
  • Determine optimal operation window for the latency of data versus process flow and quantify permissible latency for data flow when used to determine process go/no-go
  • Investigate data security and encryption requirements when sharing common process tools versus isolating process equipment between vertical segments
  • Develop open and common cross-vertical-segments communication standards and protocols for equipment

Gaps and Showstoppers

There is universal agreement that digitization will drive huge growth in data volumes. Many predict that cloud and hybrid cloud solutions are critical to enable the storage and subsequent manipulation of data by AI algorithms to derive value. However, industry members must adopt consensus-based standards and guidelines for connectivity protocols and data structures (Figure 4). Smart manufacturing is a journey, and a robust and scalable connectivity architecture must be established on which to deploy digital building blocks (e.g., AI, ML to extract the optimal value from the data). 

cross-segments-standard-equipment-connectivity-smart-manufacturing

Example critical gaps that could significantly impact the progress of the deployment and adoption of smart manufacturing are:

  • Undefined data security between vertical segments
  • Lack of machine interface standardization for data flow
  • Undefined data formats for data flow
  • Data vulnerability when security is breached
  • Robust and scalable connectivity architecture across electronics vertical segments to enabling smart manufacturing functionality (event and alarm notification, data variable collection, recipe management, remote control, adjustment of settings, interfacing with operators, etc.)

Summary

The iNEMI Smart Manufacturing Roadmap Chapter provides the situation analysis and key attribute needs for the horizontal topics within the vertical segments as well as between the vertical segments. Also, the chapter identifies the primary gaps and needs for the horizontal topics that must be addressed to enable the realization of smart manufacturing:

  • Definitions: Smart manufacturing, smart factory, Industry 4.0, AI, ML, etc.
  • Audits for smart manufacturing readiness: Develop consensus-based documentation, leverage published documents (e.g., Singapore Readiness Index [12])
  • Security: Best practices, physical, digital, local and remote access, etc.
  • Equipment diversity and data flow communications: Old, new, and mixture
  • Data attribute categorization and prioritization: Volume, velocity, variety, veracity, and value
  • Cost versus risk profile versus ROI
  • Talent pool (subject-matter experts): Data and computer scientists, manufacturing engineers, and automation
  • Standards and guidelines: Data formats and structures, communication protocols, and data retention
  • Open collaboration: SEMATECH 2.0

The gaps and needs that were identified for addressing require additional detail for the status of the different vertical segments to appropriately structure the initiatives. It was suggested to circulate surveys to gather the information to appreciate the issue. One survey format was suggested as an example template: Manufacturing Data Security Survey for IRDS FI Roadmap [13].

iNEMI, together with other organizations, such as SEMI, can organize workshops to facilitate collaboration between the electronics manufacturing industry stakeholders. In addition, iNEMI can establish cross-industry collaborative projects that can develop the enabling technologies to address the roadmap identified needs and gaps to realize smart manufacturing.

Further, organizations, such as iNEMI and SEMI, can collaborate to establish guidelines and standards (e.g., data flow interfaces and data formats) as well as lead groups to develop standards for equipment and tool hardware to reduce complexity during manufacturing. Also, iNEMI can engage other industry groups to foster the exchange of best practices and key knowledge from smart manufacturing initiatives.

The members of the roadmap TWG are committed to provide guidance during the smart manufacturing journey—people, processes, and technologies. Members of the TWG also suggested engaging microelectronics groups as well as non-microelectronics groups to assess opportunities to leverage existing smart manufacturing guidelines and standards.

Acknowledgments

Thank you to the members of the iNEMI Smart Manufacturing TWG. Their dedication, thought leadership, and deep appreciation for SMT enabling technologies was critical to preparing the roadmap chapter.

In addition, we would like to thank the participants and facilitators of the SEMI Smart Manufacturing Workshop—Practical Implementations and Applications of Smart Manufacturing (Milpitas, California, on November 27, 2018). SMT007

References

1. 2019 iNEMI Roadmap.
2. U.S. National Institute Standard and Technology’s Special Publication 800-82.
3. U.S. National Institute Standard and Technology’s Special Publication 800-171.
4. IEEE International Roadmap for Devices and Systems, Factory Integration.
5. Japan Robot Association’s Standard No. 1014.
6. SEMI E30-0418, Generic Model for Communications and Control of Manufacturing Equipment (GEM); SEMI A1-0918 Horizontal Communication Between Equipment; SEMI E5-1217, Communications Standard 2 Message Content (SECS-II); SEMI E4-0418, Equipment Communications Standard 1 Message Transfer (SECS-I).
7. Hermes Standard.
8. IPC-CFX Standard.
9. J. Moyne, S. Mashiro, and D. Gross, “Determining a Security Roadmap for the Microelectronics Industry,” 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC), pp. 291–294, 2018.
10. IEC 62443 3-2.
11. website: iec.ch/acsec.
12. EDB Singapore, “The Singapore Smart Industry Readiness Index,” October 22, 2019.
13. www.surveymonkey.com/r/ZXLS6LH.

Ranjan Chatterjee is vice president and general manager, smart factory business, at Cimetrix.

Dan Gamota is vice president, manufacturing technology and innovation, at Jabil.


Article First Posted by SMT007 Magazine

Feature by Ranjan Chatterjee, CIMETRIX
and Daniel Gamota, JABIL

Editor’s note: Originally titled, “The Convergence of Technologies and Standards Across the Electronic Products Manufacturing Industry (SEMI, OSAT, and PCBA) to Realize Smart Manufacturing ” this article was published as a paper in the Proceedings of the SMTA Pan Pacific Microelectronics Symposium and is pending publication in the IEEE Xplore Digital Library.

 

 

 

Topics: Industry Highlights, SECS/GEM, Customer Support, Doing Business with Cimetrix, Cimetrix Products

GEM: Meeting Future Needs by Building on the Stability of the Past

Posted by David Francis: Director of Product Management on Jan 8, 2020 11:00:00 AM

Mechanic-working-on-a-diesel-filter-close-up-629x419-CopyAs a young boy, I liked to work on the family car with my dad. He taught me how to change the oil, check the spark plugs, replace the shock absorbers, adjust the timing and lots of other tasks that were common on older cars. I remember the first time he let me use the socket wrench. I thought it was the greatest tool ever invented. I could loosen bolts, then moving a small switch into a different position, the same wrench could now tighten bolts. It is a very versatile tool, one I still make sure to have handy to this day. 

I appreciate having well-designed tools available that can be used in a variety of situations. In my career, these tools have sometimes been software tools. I have spent a lot of my career working with equipment connectivity standards and seeing the benefits of having process equipment connected to a factory control system. Whether it is for full equipment control, or just to monitor and gather data from the equipment, having a robust connection to equipment is valuable.  

When I first started connecting equipment to factory control systems, the GEM standard had not been finalized. There was a lot of variability in the SECS message implementations available from the different equipment vendors. I was almost always able to get the equipment connected to the factory system, but generally each connection was custom to that equipment vendor and equipment type. This meant that each connection took far too much time to complete and made supporting different equipment very difficult. 

Once the GEM standards were finalized and adopted, there was now a versatile way to provide consistency and reusability across equipment types and across equipment vendors. Connecting to different types of equipment was principally a configuration task instead of a custom coding task.  

In addition, industry standard compliance test tools were developed to ensure compliance with the GEM standards and harden the implementations for reliable production use. This increased reliability helped drive the adoption and implementation of GEM in the global semiconductor front-end manufacturing industry. As a result, GEM has become a well-established reliable communication standard that is widely used and accepted.  

As other segments of the semiconductor and related electronics manufacturing markets have looked to connect equipment to their factory control systems, many have evaluated GEM and other communication standards to provide this functionality. In some cases, GEM was considered too old, too complex, or not a good fit. But, like the versatile socket wrench, many industry segments have seen the value of the stability and proven nature of GEM. They found that the socket wrench (GEM) was the right toolthey just needed a different sized socket (industry-specific guidance) to fit their needs. Let’s look at a few examples.  

SEMI PV2 

large solar farm in England producing electricityIn 2007, when the photovoltaic industry wanted to increase manufacturing efficiencies and reduce costs, they looked to implement industry-wide standards. They formed the Photovoltaic Equipment Interface Specification Task Force to define the interface between the factory control system and the equipment. 

The task force created two working sub-teams to evaluate existing solutions and the requirements of the industry. Several existing solutions such as SECS/GEM, EDA, OPC-UA, and XML were evaluated based on functionality, reliability, extendibility, and the ability to be integrated into different environments. The conclusion of both teams was to build on the SEMI GEM (E30) standard.  

The socket wrench (GEM) was the right tool, and a new socket (SEMI PV2) provided the required fit for their equipment and industry. 

HB-LED 

In 2010, when the high-brightness light-emitting diode (HB-LED) industry started their search for connectivity standards. They needed something that would allow low-cost, common hardware and software interfaces, and other means to enable HB-LED factories to effectively utilize multiple equipment types from multiple vendors in a highly automated manufacturing environment. 

This search found that the best course was to leverage the functionality, reliability, and extendibility of GEM. The SEMI HB4: Specification of Communication Interfaces for High-Brightness LED Manufacturing Equipment (HB-LED ECI) defines the behavior of HB-LED equipment and is based on the SEMI E30 (GEM) standard.  

Again, the socket wrench (GEM) was the right tool. What they needed was a socket (HB4) that would meet the needs of their industry. 

PCBECI 

In February 2019, the Taiwan Printed Circuit Association (TPCA) initiated an activity seeking to boost network connectivity of PCB equipment and help PCB makers implement smart manufacturing practices in the industry.  

The result of this effort was the publication in August of 2019 of the SEMI A3: Specification for Printed Circuit Board Equipment Communication Interfaces (PCBECI). This is a robust and comprehensive shop-floor communication standard that specifies the detailed, bidirectional communications needed to improve productivity and reduce the costs to develop equipment interfaces for PCB manufacturing. The SEMI A3 (PCBECI) standard is based on the SEMI E30 (GEM) standard. 

Yet again, the socket wrench (GEM) was the right tool and all that was needed was a socket for their specific needs (PCBECI).  

It is understandable to think of GEM as an old and complex standard. It has been around for years and can be difficult to understand. However, it has continued to be reviewed and updated as manufacturing needs have changed. As different market segments have looked for equipment communication standards to meet their specific needs, several have found that the functionality, reliability, extendibility and the ability to be integrated into different environments provided by GEM was the right tool. All that was needed were some companion specifications related to GEM to provide a better fit for their requirements. 

Topics: Industry Highlights, SECS/GEM, Smart Manufacturing/Industry 4.0

Why implement a SECS GEM driver?

Posted by Brian Rubow: Director of Solutions Engineering on Dec 12, 2019 2:15:00 PM

A SECS GEM driver can be looked at from a factory or equipment supplier perspective. I will discuss both of them in that order.

Factory Perspective

A little background:

semiconductor-factory-1

From a factory perspective, a SECS GEM driver is the host software that talks to an equipment’s GEM interface. It allows the factory to take advantage of the features implemented in each equipment’s GEM interface. However, what the factory can do with an equipment’s GEM interface is also limited by what the equipment supplier has included in that interface. The GEM standard is very flexible and scalable, which accounts for the widespread and growing adoption of GEM technology—it can be adapted to any manufacturing equipment and market segment.

It is possible to implement features in a GEM interface. But this also means that just having a GEM interface on the equipment does not ensure that it has been correctly designed to meet the factory’s expectations. An equipment supplier’s poor implementation of GEM can frustrate a factory’s plans for Smart Manufacturing by not providing features that the factory expects that could have been implemented. The tendency of most equipment suppliers is to implement the absolute minimum functionality in a GEM interface to save money. Therefore, it is the responsibility of the factory during equipment acceptance to evaluate the GEM interface to make sure that it is robust and has the full set of required features. The factory must have a clear vision of its needs both initially and later as its Smart Manufacturing goals are realized. It is not unusual for a factory to request an upgrade to an equipment’s GEM interface with more features, but these modifications usually come at a cost.

Although a factory’s SECS GEM driver must be adaptable to different suppliers’ GEM implementations, it only needs to support the specific features that the factory uses. For example, if the factory is only concerned about alarm and event report notification, then it does not need to support the messages for recipe management, remote control or trace data collection. As such, the investment in a SECS GEM driver is proportional to the number of GRM features that are utilized. However, the SECS GEM driver should also support variations in alarm and collection event implementations, because each equipment type will support a unique set of alarms and a unique set of collection events with unique data variable for event reports. Moreover, from equipment type to equipment type, the same collection ID might have different meanings. The SECS GEM driver therefore needs an ability to adapt by having a method to characterize the GEM implementation (such as a list of available collection events) and the ability to map a general capability to the actual implementation (such as “material arrived” = collection event ID 5).

So why would a factory want to use SECS GEM technology?

factory-alan-1In order to reach the goals of Industry 4.0 and Smart Manufacturing, factories must be able to monitor and control manufacturing equipment remotely. Therefore the equipment must have a software interface to provide this functionality and the factory must be able to access and use this interface.

Factories could let the equipment suppliers choose their own implementation technologies for this kind of capability, but as a result, different suppliers might take a different approach for every equipment type. This would be tremendously expensive and resource intensive. It is far better to standardize on one or two technologies, and ideally, one that is proven to work and known to have all of the necessary features. This allows the factory to achieve its goals with minimum investment, focusing instead on using the equipment interface in creative ways to improve manufacturing.

SECS GEM is the most proven technology already widely used across the globe and supported by the most sophisticated and automated industry in the world; semiconductor manufacturing. It is also widely adopted several other industries, making it a safe choice. The range of production applications supported by SECS GEM data collection include productivity monitoring, statistical and feedback/feedforward process control, recipe selection and execution tracking, fault detection and classification, predictive maintenance, reliability tracking, and many more. By contrast, alternatives to SECS GEM have so far been demonstrated to be incomplete or immature solutions. 

What specifically can you do with the SECS GEM technology?

  1. Collection Events: Be notified when things happen at the equipment, such as when processing or inspection begins and completes, or when a particular step in a recipe is reached.
  2. Collection Event Reports: Collect data with collection events. The host chooses what data it wants to receive. For example, track the ID of material arriving and departing from the equipment, or components placed on a board.
  3. Alarms: Be notified when bad or dangerous things are detected, receive a text description of the alarm condition, and when the issue is cleared.
  4. Trace Data Collection: Tell the equipment to report status information (software and/or hardware data) at a specific interval. For example, track digital and/or analog sensors during processing at 10 Hz frequency.
  5. Recipes: Upload, download, delete and select recipes as desired, whether in ASCII or binary formats. Make sure that the right recipe is run at the right time to eliminate misprocessing and minimize scrap. Track when someone changes a recipe.
  6. Remote Commands: Control the equipment, such as when to start, stop, pause, resume and abort. Custom commands, such as calibrate, skip or anything else can be supported.
  7. Equipment Constants: Configure and track the equipment configuration settings remotely.
  8. Terminal Services: Interact with the equipment operator remotely or provide instructions for the operator.
  9. Extensions: There are numerous extensions to GEM that can be supported but are not yet form requirements. For example, implement wafer or strip maps from E142 to provide and report details about material in XML format.

Equipment Supplier Perspective

AdobeStock_12291008-1

From an equipment supplier’s perspective, a SECS GEM driver is the software used to implement GEM technology on the equipment. In other words, the software to create a GEM interface. The equipment-side software requirements are inherently more complex that the host SECS GEM driver. This is because the equipment-side features are precisely defined by the GEM standard and should be implemented to the fullest extent possible. By contrast, the host can really do whatever it wants, so a limited implementation may be sufficient. In an ideal situation, the equipment supplier will implement just enough features in its GEM interface to satisfy all of its customers and therefore ship an identical GEM interface to all its customers. It is up to the equipment supplier to decide what GEM features to implement and how to adapt them for a particular type of equipment, but the factory should provide clear expectations about its planned use of the interface. It is also the factory’s responsibility to qualify the GEM interface during equipment acceptance. Note that it is not uncommon for factories to withhold partial equipment payment until the GEM interface has also passed its own acceptance.

Some equipment suppliers include the GEM driver as a standard feature on all equipment. This is ideal because it makes the GEM interface much easier to support and distribute. Some equipment suppliers only install GEM when it is specifically purchased. This often results in installation problems because the field technicians may or may not be knowledgeable enough or specifically trained to do this correctly. Other equipment suppliers include the GEM driver on all equipment, but only enable it when the feature has been purchased. This is better than attempting GEM interface installation after equipment delivery because the GEM interface can often be enabled with a simple equipment configuration setting.

Here are some key reasons for implementing a SECS GEM driver:

1. “One ring to rule them all”

By implementing a GEM interface, an equipment supplier can avoid having to implement multiple interfaces. Because GEM is the most feature complete option, the it should be implemented first and Thoroughly integrated with the equipment control and user interface software. If other protocols must be supported, they can usually be mapped onto the GEM capabilities or a separate external system because they only include a subset of GEM functionality.

2. Equipment Supplier Application Software

If the GEM implementation includes support for multiple host connections, then the GEM interface can be used by the equipment supplier itself for many applications. For example, an equipment supplier can develop a software package that monitors and controls their specific equipment at a factory. This can run simultaneously and independently while the factory GEM host software is connected. Many factories are willing to buy applications from the equipment supplier that enhance the productivity of the equipment they have purchased. As an example, equipment suppliers are better equipped to develop predictive maintenance applications that determine when parts are approaching failure and need replacement. These applications can save the factory time and money by avoiding unscheduled downtime. Other applications can also be developed by equipment suppliers to analyze and optimize equipment execution.

3. Competitive Advantage

A well implemented GEM interface can differentiate a supplier’s equipment from that of its competitors. Factories are beginning to recognize the value in controlling and monitoring equipment remotely, and know that a poor GEM interface contributes nothing to a factory’s Smart Manufacturing initiatives. A GEM interface that goes the extra mile to be truly useful empowers the factory to excel at Smart Manufacturing and to be far more productive. Selling equipment in today’s market without a GEM interface is like selling a television without a remote. On the other hand, providing a fully featured GEM interface is like selling a smart television.

Final Words

Experts on GEM technology are available all over world. Because GEM is a mature industry standard and well defined, it can be implemented by anyone in a range of different programming languages and operating systems. however, to save time I recommend using a commercially available product rather than developing the complete GEM interface from scratch. This can save massive amounts of time and effort, and ensures the quality of the resulting implementation.

To speak with a Cimetrix GEM expert, or to find out more about our GEM software products, you can schedule a meeting by clicking the link below.

Ask an Expert

Topics: Industry Highlights, SECS/GEM, Semiconductor Industry, Smart Manufacturing/Industry 4.0

Resources Round-up: Presentations

Posted by Kimberly Daich; Director of Marketing on Oct 3, 2019 11:16:00 AM

Resource Center-1The Cimetrix Resource Center is a great way to familiarize yourself with standards within the industry as well as find out about new and exciting technologies. 

Our resource center features information about equipment connectivity and control, data gathering, GEM (SECS/GEM)EDA/Interface A, and more. These standards are among the key enabling technologies for the Smart Manufacturing and Industry 4.0 global initiatives that are having a major impact on the electronics assembly, semiconductor, SMT and other industries. Manufacturers and their equipment suppliers must be able to connect equipment and other data sources, gather and analyze data in real time, and optimize production through a wide variety of applications.

The many presentations featured in our resource center provide in-depth coverage from Cimetrix expert's presentations at many different conferences and expos around the world. Some of our most popular presentations are below.

Be sure to stop by our Resource Center any time or download the presentations directly from the links in this posting.

Resources

Topics: Industry Highlights, SECS/GEM, EDA/Interface A, Doing Business with Cimetrix, Programming Tools, Photovoltaic/PV Standards, Smart Manufacturing/Industry 4.0

Resources Round-up: Videos

Posted by Kimberly Daich; Director of Marketing on Aug 3, 2019 1:28:00 PM

Resource Center-1The Cimetrix Resource Center is a great way to familiarize yourself with standards within the industry as well as find out about new and exciting technologies.

Our resource center features information about equipment connectivity and control, data gathering, GEM (SECS/GEM)EDA/Interface A, and more. These standards are among the key enabling technologies for the Smart Manufacturing and Industry 4.0 global initiatives that are having a major impact on the electronics assembly, semiconductor, SMT and other industries. Manufacturers and their equipment suppliers must be able to connect equipment and other data sources, gather and analyze data in real time, and optimize production through a wide variety of applications. The videos and video series featured in our resource center provide in-depth coverage of some of these concepts.  Some of our featured videos are below.

Be sure to stop by our Resource Center any time or watch the videos directly from the links in this posting.

Resources

Topics: Industry Highlights, SECS/GEM, EDA/Interface A, Doing Business with Cimetrix, Programming Tools, Photovoltaic/PV Standards, Smart Manufacturing/Industry 4.0